Incorporation of fluorine in silica glass in the presence of helium and oxygen during cladding layer formation by the modified chemical vapour deposition (MCVD) process has been critically investigated for better control of process parameters to minimise the entry taper loss in the preforms without any adverse effect on fluorine incorporation efficiency.
Origin
Cgcri, Calcutta, India
Journal Title
Glass Technology 40 4 1999 127-132
Sector
Special Glass
Class
S 1737