While magnetron sputtering is a commonly used tool for deposition of thin films in research & production, the development of suitable models describing film growth on the substrate progresses slowly. One of the major reasons is the complexity of the process, in which energy & particles are delivered to the substrate in a variety of ways. Nevertheless, these effects are essential for film growth & determine the quality of obtained films. In this article, an example for characterisation of a deposition process with comparably simple & cost effective tools is show. Total energy flux to the substrate is measured by a thermal probe, electron irradiation is studied by means of Langmuir probe measurements & positive ions are measured by a retarding field analyser. The results help to understand the principles of film growth & give insights on thermal load onto substrates. during deposition.
