Machining Of Silica Glasses Using Excimer Laser Radiation

Various silica glasses were engraved deliberately by excimer laser radiation using wavelengths of 308 and 248nm. The ablation of different samples was investigaed by systematic variation of the processing parameters. The ablation rates were determined using profilometry and gravimetric measurements by evaluating the processing quality and the morphology of the processed surfaces was considered.

Author
H Hornberger Et Al
Origin
Universitat Erlangen-Nurnberg, Germany
Journal Title
Glastech Ber Glass Sci Technol 69 2 1996 44-49
Sector
Special Glass
Class
S 995

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Machining Of Silica Glasses Using Excimer Laser Radiation
Glastech Ber Glass Sci Technol 69 2 1996 44-49
S 995
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