High Quality Polysilicon Films For Flat Panel Displays Formed On Glass Above The Strain Point

Amorphous polycrystalline silicon films deposited on borosilicate glasses were annealed at temperatures above the strain point of the glass. Conditions which ensure avoidance of glass deformation are established. The structural charcteristics of the crystallised poly-Si films and the quality of the poly-Si/glass interface were studied by combined plane view and cross-section transmission electron microscopy observations. The microroughness of the glass panel before and after the high temperature annealing was measured by Atomic Force Microscope (AFM).