Fabrication And Electrical Evaluation Of Mosi2-Si Composite Thin Films

Thin films of a composite of molybdenum disilicate (MoSi2) and silicon (Si) were fabricated by radio frequency magnetron sputtering using a target made of a powder mixture of MoSi2 and Si with a molar ratio of Si to Mo of 1:X (2.0

Author
S Hikita Et Al
Origin
Doshisha University, Kyoto, Japan
Journal Title
J Aust Ceram Soc 47 2 2011 69-73
Sector
Special Glass
Class
S 3732

Request article (free for British Glass members)

Fabrication And Electrical Evaluation Of Mosi2-Si Composite Thin Films
J Aust Ceram Soc 47 2 2011 69-73
S 3732
Are you a member?
This question is for testing whether or not you are a human visitor and to prevent automated spam submissions.
12 + 3 =
Solve this simple math problem and enter the result. E.g. for 1+3, enter 4.