Adhesion And Delamination Of Tantalum And Chromium Films On Glass

The adhesion and delamination behaviour of sputtered Ta and Cr films on barium boroaluminosilicate glass were investigated. The locus of delamination was determined by XPS analysis of peeled film strips to be at the film-glass interface. We found a strong correlation between the intensity and thickness of the metal suboxide interphase layer formed and resistance to film delamination. For Ta, we found that the presence of a sufficiently thick TaOx layer at the glass-film interface effectively prevented debonding of the film from the glass substrate. The role of oxygen in metal-glass bonding chemistry was explored by sputter deposition of metal films with in situ oxygen or air dosing.

Author
E C Onyiriuka Et Al
Origin
Corning New York
Journal Title
Corning Research 1997 123-134
Sector
Special Glass
Class
S 1452

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Adhesion And Delamination Of Tantalum And Chromium Films On Glass
Corning Research 1997 123-134
S 1452
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