Modelling Processes In Oxide-Silicate Systems Treated By Plasma For The Purpose Of Improving Coating Quality

High temperature processes in oxide-silicate systems running under the effect of plasma were modelled. Plasmotrons were used which have applied in analytical chemistry at atomic emission analysis. The choice of these sources resulted from studying interactions of plasma with solid material surfaces. To explain the high temperature mechanisms found, thermodynamic modelling was carried out using Astra software package.

Author
Un-named
Origin
Unknown
Journal Title
Glass Ceram Jan-Feb (1-2) 2004 59-62
Sector
Special Glass
Class
S 2852

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Modelling Processes In Oxide-Silicate Systems Treated By Plasma For The Purpose Of Improving Coating Quality
Glass Ceram Jan-Feb (1-2) 2004 59-62
S 2852
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