Laser For Thin Film Deposition

Lasers can be used to deposit thin films by condensing on a substrate the material that is ablated from a target under the action of a high poser laser beam focused on it. Depending on the laser characteristics, ablation could take place in equilibrium conditions, as in laser-induced thermal evaporation, or far from equilibrium when the target is hit by a high power pulsed laser beam.

Author
Un-named
Origin
Unknown
Journal Title
Vacuum International 3/2008 41-45
Sector
Special Glass
Class
S 3431

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Laser For Thin Film Deposition
Vacuum International 3/2008 41-45
S 3431
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